Surging chipmaker demand tests Carl Zeiss SMT’s ability to convert precision optics investments into qualified output for ...

ASML's customers are requesting more lithography equipment than the company currently plans to supply for 2027 and 2028. The ...

ASML’s plans to expand EUV production depend partly on Zeiss’s ability to increase qualified precision-optics output.

Recently, a groundbreaking technical paper has been jointly published by leading researchers from Carl Zeiss SMT, a global ...

Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.” Abstract Summary: The researchers examine Hyper-NA EUV ...

The Technology Development Board (TDB), under the Department of Science and Technology (DST), Government of India, has signed ...

New role reflects the enduring and growing strategic significance of the region for ZEISS' long-term roadmap. Christian will represent ZEISS North America, lead region-wide initiatives, and identify ...

ASML CEO Christophe Fouquet expects AI's impact to unfold over 10 to 15 years. Company documents show the gap between expanding current EUV output and adopting High NA, plus supplier limits and AI use ...

DUNE corrects wafer bow one wafer at a time, NLX brings X-ray inline, and mask tools get ready for High-NA's larger reticles ...

Solutions for inline X-ray inspection and wafer warpage correction address key challenges in advanced semiconductor ...

(Bild: Zeiss SMT) High-NA-EUV hat gerade einmal die Serienfertigung erreicht, doch die Entwickler von Zeiss und ASML denken bereits voran. Hyper-NA soll die numerische Apertur von 0,55 auf mindestens ...

Kürzlich haben renommierte Forscher der beiden führenden Hightech-Unternehmen Carl Zeiss SMT und ASML ein aktuelles ...