Abstract: In this Letter, we employed atomic layer deposition (ALD) and flash lamp annealing (FLA) to form a wafer-scale ultra-shallow junction (USJ, ~5 nm) in silicon. The deep ultraviolet light is ...
Abstract: In this study, we address the design and fabrication challenges typically encountered with planar nanoscale air channel diodes (NACDs) by introducing oblique deposition techniques, achieving ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results